Sputtering with magnetron, a plasma-based coating process, for the deposition of thin films of metallic and insulating materials with excellent adhesion onto a substrate. The plasma, magnetically confined, is generated near the surface of a target material, then ions from the plasma positively charged impact with the target material negatively charged and atoms from this target material are ejected or “sputtered”, which then deposit on a substrate. Sputtering technique bonds atoms onto a substrate creating thin, uniform and very cost-effective films. Illustrative pics: